采用真空镀膜工艺在微晶玻璃衬底上沉积了WO3薄膜,WO3薄膜从300～600℃分别进行了退火热处理,随着退火热处理温度的不同,WO3薄膜从晶粒尺寸上以及晶相上都发生了较大的变化,并用SEM、XRD等手段进行了分析,随着退火热处理温度的升高,WO3晶粒逐渐增大,并实现了从非晶向晶态的转变,最终得到了六方结构并且是在[100]方向上择优取向的WO3薄膜,获得了稳定性较好的工艺条件,为进一步开发研制WO3气敏元件提供了技术基础.
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